Academic webpage>Research

 

for publications click here


X-ray Reflectivity (XRR)

X-ray reflectivity (XRR) is a non-destructive, non-contacting method to measure film thickness, interface and surface roughness and density of films ranging from 20 � to 1 mm total thickness. Films can be single or multilayer structures, and the thickness of individual layers can be determined with no optical constant corrections required. The films can be epitaxial, polycrystalline or amorphous. The thickness of the film is measured from the periodicity of fringes, the density from the angle at which the intensity begins to drop and the roughness from the damping of the thickness fringes and rate of intensity decrease with angle. These are not affected by the crystallinity of the film. XRR is basically a grazing incidence scattering technique, with the incident and scattered beams at equal angles to the surface of the sample. In XRR, an X-ray-beam strikes a solid-surface at a small angle (0-2) and is totally reflected. Above the critical angle of total reflectance qc beam penetrates the sample. Measurement of the critical angle provides the determination of the density of the material. If the sample contains a thin layer, X-rays are reflected from the air/layer as well as from the layer/substrate interfaces. This leads to the interference fringes. In this case the position of the mth order fringe maximum qm can be shown to be related to the layer thickness t and the critical angle qc by the following simple equation.


 

 
qm =
    

 

 
(m+1/2)l

2t
 


2

 
 
+qc2
 
 
,ns > nl
 
 
 
    

 

 
ml

2t
 


2

 
 
+qc2
 
 
,ns < nl
  (0.1)

where ns and nl are the refractive indices of the substrate and the layer for X-ray of wavelength l. From this formula, thickness of the layer can be derived.
 

Reflection from ideal layered structures  : The X-ray reflectivity from a layer structure can be calculated by applying the recursive theory of Parratt [1], a generalization of the Fresnel reflectivity theory, to a system of flat, ideal layers, each with a constant electron density. The refractive index n of a material, is given by:


 

n=1-d-ib
(0.2)

where d+ib is related to the atomic scattering factors of a particular type of atom. Thus, the refractive index of matter for X-rays is less than unity. Due to this reason, at a grazing angle below a certain critical angle qc a beam of X-rays incident on a surface will be totally reflected. Applying Snell's law in the small angle approximation one can show that qc={2d}.

xrr_layer.gif

Figure 0.1: Multilayer representation for calculation of X-ray specular reflectivity. Each layer j is defined by its thickness tj, refraction index nj, and roughness of the bottom interface sj. Total of N layers are considered plus the incident space vacuum and the substrate.

Let us consider the specular reflection of X-rays with an angle of incidence q from a system of N smooth homogenous layers as illustrated in Fig. 0.1. The refractive index of the jth layer is denoted by nj=1-dj-ibj, the reflection amplitude (fresnel amplitude) of the interface between the j-1th and jth layers is denoted by rj-1,j and the electric vectors of the incident and reflected waves at the interface between the j-1th and jth layers are denoted by Ej-1,j and Erj-1,j, respectively. Maxwell's equations require that the tangential component of the total electric field be continuous at each of the jth interfaces. The solution to this problem leads to a recursive formula for the reflection amplitude Rj-1,j of the stack of layers from the substrate to the interface between the jth and j-1thlayers:


 

Rj-1,j=a4j-1
rj-1,j+Rj,j+1

Rj,j+1rj-1,j+1
 


 
(0.3)

where
 

Rj,j+1=a2j-1
Erj,j+1

Ej,j+1
 


rj-1,j=
fj-1-fj

fj-1+fj
 


fj=(q2-2dj-2ibj)
(0.4)

and aj is the phase factor for half the thickness tj


 

aj=exp
-i p

l
 

fjtj
 
(0.5)

The recursion formula is solved by starting at the substrate (layer N) whose thickness is assumed to be infinite and therefore there is no reflected wave in it; hence RN, N+1 is zero.

One then solves the equation with j=N and continues recursively until the top of the layer of the material is reached (j=1), where a1 is unity, giving the reflectivity
 

R0,1=
Er0,1

E0,1
 


 
(0.6)

The ratio of the reflected to the incident X-ray intensities is given by the product of R0,1 with its complex conjugate
 

  Ir

I0
 

=|R0,1|2
(0.7)

In the above analysis, we assumed perfectly smooth surfaces. However, the real surfaces and interfaces are not infinitely sharp as assumed above. In general we have some roughness which can be taken into account by considering the so called Born Approximation (BA) or Distorted Wave Born Approximation (DWBA) [2]. The BA is valid when reflectivity is small, whereas DWBA is valid when reflectivity approaches unity. In general, the reflection amplitude r which is valid for both the BA and DWBA, is written in the following form:


 

r=rFexp{-1/2(sj-1, j2SjSj-1)}
(0.8)

where rF is the reflection amplitude for a single ideal surface, also called as Fresnel amplitude. sj-1, j is the root-mean-square roughness between the j-1th and jth layers. Sj and Sj-1 are the scattering vectors for the j-1th and jth layers, respectively. This can be substituted in the reflection amplitude from the interface between j-1th and jth layers.
 

rj-1,j= fj-1-fj

fj-1+fj
 

exp(-1/2(sj-1,j2SjSj-1))
(0.9)

This modified Parratt formalism will be used in this work for XRR simulations to evaluate the layer thickness and interface/surface roughness.

Bibliography

[1]
L. G. Parratt, Phys. Rev. 95, 359 (1954).
[2]
S. K. Sinha, E. B. Sirota, S. Garoff, and H. B. Stanley, Phys. Rev. B 38, 2297 (1988).

File translated from TEX by TTH, version 3.68.
On 26 Oct 2005, 14:56.

 

Last Updated Wednesday October 26, 2005


Useful links

X-ray Reflectivity Thin Film Analysis� Some Practical Skills

X-ray Reflectivity Studies of Thin Film

X-ray templates

Rigaku XRR

Cornell University Smilgies

Foundations:

Molecular Beam Epitaxy

Reflection High Energy electron Diffraction (RHEED)

High Resolution X-Ray Diffraction

X-ray reflectivity

In-situ Kerr Effect (MOKE)

SQUID Magnetometry

Magnetotransport

SPINTRONICS BASICS

Google Scholar

Pranaba Kishor Muduli
Paul-Drude-Institute for Solid State Electronics , Hausvogteiplatz 5-7, 10117 Berlin, Germany
Tel: 0049-30-20377-364,362 (Office, Lab), Fax: 0049-(0)30-20377-201, Mobile: 0049-1797675814, 0049-30-25019329
 Email: [email protected]/[email protected]
Hosted by www.Geocities.ws

1