Contents of Plasma Research

07/30/03

Bahasa Indonesia: tekan disini

In this field, I do some research on the plasma processing for semiconductor fabrication, especially concerning with particle contamination and thin film deposition. I do experiments on visualization of particle trapping behavior in the plasma-enhanced chemical vapor deposition (PECVD) reactor using laser light scattering (LLS) method combined with video imaging. The relationship between particle trapping behavior and particle contamination on the wafer is elucidated. This information is very important for particle contamination control in this process. In addition, I also do some experiments on the silica thin film deposition process using Tetraorthosilicate (TEOS)/oxygen plasma. Effects of particle formation on the film properties are investigated. Some of these works have been published in various Journal, e.g. Journal of Applied Physics, Journal of Aerosol Science (see Publication), and some are in preparation for publication.

In order to get better insight into the observed phenomena obtained from visualization, I perform theoretical investigation on particle motion in the plasma reactor. Because particle behavior in the plasma is very complicated, I began the analysis on the particle behavior in this reactor without plasma. This work has been published in Chemical Engineering Science in 2002 (see Publication). Now, I am studying theoretically the particle transport and motion in the PECVD reactor.

You can look at the pages below about what I am working on. I hope this information can help you to understand my works. If you have any question or interested in my works, please do not hesitate to contact me.