CENTRALCOMPOSITEDESIGNSFORFOURFACTORS

N
0
11
140
30
150

=17
+1
12.1
150
40
200

Level
Base Dose Base Energy Base anneal SI Etched

-2
9.10 123
13
50

-1
9.9 130
20
100

+2
12.8 167
47
250

X
BASE³
FOR ANNEALTIME
-
-
-
-
+
+
+
+
0
0
0
0
2
-2
0
0
0

X
BASE DO¹
SE
-
+
-
+
-
+
-
+
2
-2
0
0
0
0
0
0
0

X
BASE ENERG²
Y
-
-
+
+
-
-
+
+
0
0
2
-2
0
0
0
0
0

X

₄= X*X₂*X
SIET¹
CHED³

-
+
+
-
+
-
-
+
0
0
0
0
0
0
2
-2
0

RUN
1
2
3
4
5
6
7
8
9
10
11
12
13
14
15
16
17

Hfe
114
106
71
52
129
86
63
56
64
96
42
138
76
78
86
69
77