MOTIVE / FIELD OF RESEARCH: 

         Study of Swift Heavy Ion Irradiation Induced Effects in Semiconductor Materials and Devices:
                 1. Irradiation with energetic ions (1MeV-3MeV & 100MeV-150MeV)
                2. Characterization by I-V, C-V, TSCAP, TSC, DLTS, IR, XRD, Glancing Angle XRD, XPS, AFM,SEM with EDAX,
                    TEM, UV-Visible Absorption Spectroscopy, Temperature Dependent Four Probe Resistivity Measurements and RBS.
               3. Fabrication of Metal/Semiconductor Junction Devices and their Characterization

RESEARCH EXPERIENCE:

                Working since March 1996 in the general area of SEMICONDUCTOR PHYSICS with the specific aim of SURFACE MORPHOLOGICAL as well as INTERFACIAL STUDIES of Swift Heavy Ion Irradiation Induced Effects on compound as well as elemental semiconductors using different characterization techniques. Moreover, I have also hands on experience for synthesis and characterization of semiconductor nano-particles. During my stay at IUC, I was actively engaged in operation and maintenance of ESCA Machine along with the data (AES, XPS, UPS) analysis for in-house publications as well as external users from different universities/institutions. Moreover, during operation and maintenance of ESCA machine, I have also hands on experience for UHV systems. Here I am pursuing energetic ions (1-3MeV and 100-150MeV) induced near surface modifications in semiconductor materials as a function of irradiation temperature, angle of incident and charge state of projectile ions. Hands on experience for following techniques: Electronic Flow Characterization techniques: Current-Voltage Measurement (I-V), Capacitance-Voltage Measurement (C-V), Thermally Stimulated Capacitance (TSCAP), and Thermally Stimulated Current (TSC). Surface morphological techniques: Atomic Force Microscopy (AFM) and Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM) Chemical Analysis techniques: X-ray Photoelectron Spectroscopy (XPS), Ultra-Violet Photoelectron spectroscopy (UPS), EDAX, and Secondary Ions Mass Spectroscopy (SIMS). Structural Analysis techniques: X-Ray Diffraction (XRD), Infra-Red Spectroscopy (IR), UV - Visible Absorption Spectroscopy.