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05/26/04

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Artikel Journal

  1. M. Shimada, K. Okuyama, H. Setyawan, Y. Iyechika, and T. Maeda, Effects of pressure and gas feed rate on growth rate profile of GaN thin film in vertical MOCVD reactor (in Japanese), Kagaku Kogaku Ronbunshu, 26(6), 804-810 (2000). Abstract
  2. A. Altway, H. Setyawan, Margono, and S. Winardi, Effect of particle size on simulation of three-dimensional solid dispersion in stirred tank, Trans. IChemE part A (Chem. Eng. Res. Des), 79, 1011-1016 (2001). Abstract
  3. H. Setyawan, M. Shimada, K. Ohtsuka, K. Okuyama, Visualization and numerical simulation of fine particle transport in a low-pressure parallel plate chemical vapor deposition reactor, Chem. Eng. Sci., 57(3), 497-506 (2002). Abstract
  4. H. Setyawan, M. Shimada, & K. Okuyama, Characterization of fine particle trapping in a plasma-enhanced chemical vapor deposition reactor, J. Appl. Phys., 92(9), 5525-5531 (2002). Abstract
  5. H. Shinagawa, H. Setyawan, T. Asai, Y. Sugiyama, & K. Okuyama, An experimental and theoretical investigation of rarefied gas flow through circular tube of finite length, Chem. Eng. Sci., 57(19), 4027-4036 (2002). Abstract
  6. H. Setyawan, M. Shimada, Y. Imajo, Y. Hayashi, and K. Okuyama, Characterization of particle contamination from individual process steps of plasma-enhanced chemical vapor deposition operation, J. Aerosol Sci., 34(7), 923-936 (2003). Abstract
  7. H. Setyawan, M. Shimada, Y. Hayashi, K. Okuyama and S. Yokoyama, Particle formation and trapping behavior in a TEOS/O2 plasma and their effects on contamination of a Si Wafer, Aerosol Sci. Technol., 38(2), 120-127 (2004). Abstract
  8. Hayashi, Y., M. Shimada, H. Setyawan, K. Okuyama, and N. Kashihara: Effects of Gas Flow Rate on Particulate Contamination in a PECVD Reactor, J. Soc. Powder Technol., Japan, 42(2), 105-109 (2005).
  9. H. Setyawan, M. Shimada, Y. Hayashi, K. Okuyama, and S. Winardi, Modeling of and experiments on dust particle levitation in the sheath of an rf plasma reactor, J. Appl. Phys., 97, 43306-43311 (2005).
  10. H. Setyawan, M. Shimada, Y. Hayashi, and K. Okuyama, Removal of particles during plasma processes using a collector based on the properties of particles suspended in the plasma, J. Vac. Sci. Technol. A, 23(3), 388-393 (2005).
  11. M. Shimada, H. Setyawan, Y. Hayashi, N. Kashihara, K. Okuyama, and S. Winardi, Incorporation of particles into a growing film during silicon dioxide deposition from a TEOS/O2 plasma, Aerosol Sci. Technol., 39, 408-414 (2005).
  12. T. Moriya, Y. Imajo, M. Shimada, K. Okuyama, and H. Setyawan, Observation of heat-induced particle resuspension and transport within a vacuum chamber, Jpn. J. Appl. Phys., 44, 4871-4877 (2005).
  13. Setyawan, H., Pemuatan listrik bipolar untuk partikel aerosol, Jurnal Teknik Kimia Indonesia, 4(3), 287-295 (2005).
  14. N. Kashihara, H. Setyawan, M. Shimada, Y. Hayashi, C. S. Kim, K. Okuyama, and S. Winardi, Control of particle generation in a plasma process using a sine-wave modulated rf plasma, J. Nanoparticle Res., (2006) in press.

Proceeding Seminar

  1. H. Setyawan, S. Yoshikawa, C. Kuroda, & K. Ogawa, Flow patterns of coal-water mixture in an agitated tank with turbine impeller, Regional Symposium on Chemical Engineering, Jakarta, Indonesia, 1996.

  2. A. M. Yuliati, I. Nurlaili, O. J. Hwie, H. Setyawan, A. Altway, & S. Winardi, Analisis dua dimensi medan aliran didalam tangki berpengaduk, Seminar Fundamental dan Aplikasi Teknik Kimia, Surabaya, Indonesia, 1997.

  3. A. R. Tuhu, Wahyudiono, S. Machmudah, H. Setyawan, A. Altway, Musfil, A. S., & S. Winardi, Hidrodinamika bed terfluidisasi gas-padat-cair, Seminar Fundamental dan Aplikasi Teknik Kimia, Surabaya, Indonesia, 1997.

  4. S. Winardi, Abubakar, Mushodaq, Suci, M. N., & H. Setyawan, Pengaruh distribusi ukuran partikel dan additive terhadap rheology dan stabilitas coal-water mixture (CWM), Seminar Teknik Kimia Soehadi Reksowardojo, Bandung, Indonesia, 1998.

  5. S. Winardi, H. Setyawan, O. J. Hwie, & A. Altway, Hydrodynamics of a gas-liquid-solid reactor stirred with multiple impeller system, 3rd International Symposium on Mixing in Industrial Processes, Osaka, Japan, 1999.

  6. A. Altway, H. Setyawan, & S. Winardi, Three-dimensional analysis of flow field in a stirred tank, Regional Symposium on Chemical Engineering, Songkla, Thailand, 1999.

  7. H. Setyawan, S. Machmudah, & S. Winardi, Particle resistance based model to predict voidage-liquid velocity in a solid liquid fluidized bed, Regional Symposium on Chemical Engineering, Songkla, Thailand, 1999.

  8. H. Setyawan, Y. Fujishige, K. Ohtsuka, M. Shimada, & K. Okuyama, Measurement and numerical simulation of behavior of fine particles in a CVD reactor, SCEJ autumn meeting 33th, Shizuoka, September 2000.

  9. H. Setyawan, M. Shimada, K. Ohtsuka, & K. Okuyama, Experiment and numerical simulation of particle transport in a low-pressure thin film preparation reactor, 2nd Asian Aerosol Conference, Pusan, Korea, July 1-4, 2001.

  10. H. Setyawan, M. Shimada, Y. Imajo, & K. Okuyama, Particle trapping phenomena in a plasma CVD reactor, International Aerosol Conference 2002, Taipei, Taiwan, September 9-14, 2002.

  11. H. Setyawan, M. Shimada, Y. Imajo, & K. Okuyama, Characterization of particle contamination in process stages of PECVD operation, SCEJ autumn meeting 35th, Kobe, September 17-20, 2002.
  12. H. Setyawan, M. Shimada, Y. Imajo, and K. Okuyama, Contribution of individual process steps on particle contamination during plasma CVD operation, 203rd Meeting of The Electrochemical Society, Paris, France, April 27 - May 2, 2003.
  13. M. Shimada, Y. Imajo, Y. Hayashi, K. Okuyama and H. Setyawan, Relation between dust particle properties and operation in a PECVD reactor for thin film preparation, The 20th Symposium on Aerosol Science and Technology, Japan Association of Aerosol Science and Technology, Tsukuba, Japan, July 29-31, 2003.
  14. M. Shimada, H. Setyawan, Y. Hayashi, N. Kashihara, and K. Okuyama, Particle formation and its effect on silicon wafer contamination during thin film preparation using TEOS/oxygen plasma, 22nd Annual Conference of American Association for Aerosol Research (AAAR), California, US, October 20-24, 2003.
  15. M. Shimada, K. Okuyama, N. Kashihara, and H. Setyawan, Control of generation of dust particles in a PECVD reactor for SiO2 film deposition, 4th Workshop on Fine Particle Plasmas, National Institute for Fusion Science, Toki, Japan, December 1-2, 2003.

 

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