Curriculum Vitae

Personal and contact informations

Name:	Pietro
Surname:	Mandracci
Institution:	Politecnico di Torino - Department of Materials Science and Chemical Engineering
Address:	c.so Duca degli Abruzzi 24, I-10129 Torino, Italy
Telephone:	+39 011 090 7383
Fax:	+39 011 090 7399
Email:	[email protected]

Ph.D. in Electronic Devices
February 2001, Trento University
Thesis title: Growth and Characterization of SiC Thin Films by a Plasma Assisted Technique for Electronic Applications
Graduated in Physics (full honors)
July 1996, Torino University
Thesis title: Physical Properties and Stability of Silicon Based Amorphous Semiconductors

2007 - Present
Confirmed Assistant Professor at Politecnico di Torino
Materials and Microsystems Laboratory (ChiLab)
January 2004 - December 2006
Assistant Professor at Politecnico di Torino
Materials and Microsystems Laboratory (ChiLab)
November 2000 - December 2003
Fellowship at Politecnico di Torino:
Technologies for silicon based micro-electro-mechanics
December 1997 - October 2000
Ph.D. student in Electronic Devices, Universita di Trento, Politecnico di Torino and Universita di Genova (consortium):
Growth and characterization of polycrystalline and epitaxial SiC
April - November 1997
Fellowship at the Istituto Elettrotecnico Nazionale Galileo Ferraris,Turin:
Project, realization and characterization of a-Si:H and a-SiC:H based UV detectors
Project of multilayer structures for optical filters by numerical optimization techniques
January - March 1997
Research collaboration at INFM (National Institute for the Physics of Matter):
Growth and characterization of silicon based thin films
September - November 1996
Post-graduated grant at INFM (National Institute for the Physics of Matter):
Development of a program for the simulation of carrier photogeneration in solar cells with variable energy gap profile

Member of the International Advisory Committee of Symposium G at the E-MRS 2003 Spring Meeting
Referee for the following journals:
- Solid-State Electronics
- Surface and Coatings Technology
- Journal of the Electrochemical Society
- Applied Surface Science

2006: listed in Who's Who in the World 2006, published by Marquis Who's Who
2003: listed in Who's Who in Science and Engineering 2003-2004, published by Marquis Who's Who
2001: European Material Research Society - Young Scientists Award

Semiconductors and insulators
- amorphous Si-based alloys (a-Si:H, a-SiC_x:H, a-SiN_x:H, a-SiO_x, a-SiO_xN_y, a-SiC_xO_yN_z)
- microcrystalline and polycrystalline Si
- polycrystalline and epitaxial SiC
Biocompatible protective and diffusion barrier materials
- Al-based alloys (AlO_x, AlN_x, AlN_xO_y)
Electronic devices
- a-Si:H and a-SiC:H based UV detectors
- pressure sensors based on polycrystalline-SiC
- Schottky diodes based on 4H-SiC
Materials, processes and devices for biomedical applications
- thin film coatings and surface modification processes for dental prostheses and implants

Techniques for thin films growth and surface modifications
- CVD and PVD techniques
- plasma-assisted techniques for thin-film growth
- plasma-assisted etching and surface cleaning
- plasma-assisted surface functionalization
Non-thermal plasma processes
- plasma-driven catalysis (PDC) processes for the abatement of atmospheric pollutants

Thin films growth and surface modification
- Plasma Enhanced Chemical Vapor Deposition (PECVD)
- Physical Vapor Deposition (PVD)
- Plasma Etching and Reactive Ion Etching (RIE)
Thin film characterization
- Optical transmittance and reflectance measurements
- Sub-gap optical absorption measurement
- FTIR spectroscopy
- Raman spectroscopy
- X-ray diffractometry
Numerical computation
- simulation of the optical absorption in solar cells
- simulation of the optical properties of thin films
- project and optimization of multilayer structures
Computer related skills
- operative systems: DOS, Windows, Linux
- office applications: MS Office, Open Office
- software for data analysis: Origin, Grace, QtiPlot
- programming languages: C, Fortran, Python

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