General Overview Technical Overview Technical Details Resolution Light Sources Exposure Coat/Develop Metrology Photoresists, Anti-Reflective Coatings, Adhesion Promoters Photomasks OPC Matching Illumination To Read...

General Overview

• Photolithography at Wikipedia

Technical Overview

• Lithography by Chris Mack
• Photolithography Glossary by Chris Mack, hosted by KLA-Tencor
• Photolithography Timeline by Atsuhiko Kato
• Optical Lithography...40 years and holding by John Bruning
• Immersion Lithography by Chris Mack
• Photolithography Simulation dissertation by Heinrich Kirchauer

Technical Details

Resolution

• Minimum feature size = k λ / NA
• Depth of focus = 0.6 λ / NA²
• f/# ≈ 1 / 2 NA
• Resist thickness ∝ η / √(spin speed)
• Resolving Power at Wikipedia

Light Sources

Exposure

• Steppers at Wikipedia
• Numerical Aperture at Wikipedia
• Double Pattering at Wikipedia
• ASML
• Canon
• Nikon Precision
• Ultratech
• Projection Photolithography by Masud Mansuripur and Rongguang Liang
• Depth-of-focus and the alternating phase-shift mask by Chris A. Mack

Coat/Develop

• Spin Coating at Wikipedia
• How to Minimize Resist Usage During Spin Coating by Bob Lorefice, Dalton Chen, Bette Mullen, Emir Gurer, Ph.D. -- Semiconductor International, 6/1/1998
• Spin Coat Theory at Brewer Science

Metrology

• Leica

Photoresists, Anti-Reflective Coatings, Adhesion Promoters

• Photoresist at Wikipedia
• Hexamethyldisilazane at Wikipedia
• Brewer Science
• Shin Etsu
• TOK America

Photomasks

• Dai Nippon Printing
• Photronics
• Toppan Photomasks

OPC

Matching

Illumination

To Read...

• http://scitation.aip.org/getpdf/servlet/GetPDFServlet?filetype=pdf&id=JVTBD9000006000003000862000001&idtype=cvips&prog=normal
• http://ieeexplore.ieee.org/iel5/8496/26864/01194468.pdf?arnumber=1194468
• http://icpr.snu.ac.kr/resource/wop.pdf/J01/2006/049/R01/J012006049R010246.pdf
• http://www.freepatentsonline.com/20020076621.html
• http://www.ece.nus.edu.sg/stfpage/eleaao/Papers/2006/Swing%20Effects%20in%20Alternating%20Phase%20Shift%20Mask%20Lithography%20Implications%20of%20Low%20Illumination.pdf
• http://icpr.snu.ac.kr/resource/wop.pdf/J01/2003/042/S02/J012003042S020276.pdf
• http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=798267
• http://www.research.ibm.com/journal/rd/411/brunner.html
• http://litel.net/Products_SMI.htm
• http://www.ltm-cnrs.fr/IMG/pdf/FuardSPIE04.pdf
• http://www.freshpatents.com/Sub-resolution-assist-feature-to-improve-symmetry-for-contact-hole-lithography-dt20070215ptan20070035031.php
• http://www.advlitho.com/v2/paper/GaAsPoster.pdf
• http://www.lithoguru.com/scientist/litho_papers/2005_Thirty_Years_of_Lithography_Simulation.pdf
• http://jjap.ipap.jp/link?JJAP/42/3776/
• http://www.mentor.com/techpapers/fulfillment/upload/mentorpaper_26298.pdf
• http://www.ultratech.com/pdf/ocg93thi.pdf
• http://www.tamsci.com/pdfs/8032J-844.pdf
• http://findarticles.com/p/articles/mi_qa3751/is_199701/ai_n8734500

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